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7200 Preconcentrator

The Perfect Choice for TO-14A and TO-15 Applications!

The 7200 Preconcentrator represents the next generation in GC and GCMS sample preparation systems for the analysis of vapor-phase volatile compounds. The 7200 takes an industry standard, the 7100A’s 3-stage preconcentration and water management technology, and elevates it to a whole new level. Many of the past limitations often seen in rotary valve based devices are now eliminated by combining digital valve isolation control with advanced robotic autosamplers, dropping the potential for carryover and cross-contamination far below previously obtainable levels.

SKU: 01-7200

 

 

7200A

Whether your laboratory uses Liquid Nitrogen or your desire is to be LN2 free, Entech has the most advanced and accurate solutions in the industry. For TO15 and the new TO15A canister methods,  Entech is now introducing an even faster LN2 based solution, our 7200A, that nearly doubles the sample throughput of our previous LN2 based technology, while still offering all the superior water management and accuracy that our customers have come to expect.  Rather than taking 45-50 minutes injection to injection, the 7200A does this in typically under 25 minutes, thanks to our new EFIT – Extremely Fast Injection Technology.

With EFIT, the sample is deposited on the column in less than 1 second, producing peak widths of just  1.7 – 2 seconds to allow separation with shorter and narrower columns with only 0.5 um film thicknesses.  The 7200A with EFIT creates a whole new standard of productivity with the complete suite of TO-15 compounds eluting in under 10 minutes!

Doubling your throughput is like someone giving you a free GCMS, as well as another free preconcentrator, since one system can generate the data of 2 systems.  Would you spend another $2-3 in LN2 to allow you to run another sample without the space or cost of another GCMS?  Whether you are a contract lab or an agency needing to improve efficiency, faster throughput simply makes good sense.  As costs lower, your ability to compete dramatically increases, allowing you to stay ahead of the curve.

 

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